Independently developed! Xinshang Weizhuang's 350nm stepper projection lithography machine passes process verification.

Shanghai AMIES Technology Co., Ltd. (referred to as “AMIES”) recently announced that its self-developed 350nm step-and-repeat projection lithography machine (AST6200) has successfully passed process verification by a leading domestic compound semiconductor customer and has secured bulk repeat orders.

Back in November 2025, AMIES’ first AST6200 lithography machine completed factory commissioning and acceptance and was officially shipped to the customer site. As a core piece of equipment for compound semiconductor and advanced display processes, the AST6200 can be widely applied in power devices, RF front-end, optoelectronic chips, and Micro LED new displays, demonstrating outstanding advantages in three key dimensions: critical process performance, process adaptability, and software self-sufficiency.

In terms of critical process performance, the AST6200 is equipped with a high-performance projection lens and advanced illumination modes,stably achieving 350nm high-resolution fine patterning capability and fully covering lithography requirements for a variety of substrate materials including Si, SiC, GaN, GaAs, InP, and sapphire.

The high-precision alignment system ensures precise overlay between multi-layer patterns, significantly improving device yield. Meanwhile, the collaborative design of the high-illumination light source, high-speed substrate transfer system, and high-dynamic motion stage greatly increases per-unit-time throughput, effectively reducing the customer’s total cost of ownership (COO) per chip.

In terms of strong process adaptability, the device’s innovative focus and leveling system can stably measure a variety of substrates, including transparent, semi-transparent, opaque, and large-step types, ensuring exposure quality under complex substrate conditions. The inclusion of flat-edge alignment and backside alignment modules enables it to meet the requirements of complex processes such as crystallographic orientation cleavage of special substrates and bonded wafer alignment.

Additionally, the AST6200 supports substrates from 2 inches to 8 inches and is compatible with mainstream substrate types including flat, double-flat, and notch, truly achieving “one machine for multiple uses” and bringing customers tremendous flexibility in production line switching.

The full-stack proprietary software control system is also a core highlight of the AST6200. Independently developed by AMIES, this system achieves 100% independent control from underlying drivers to upper-level process management, offering powerful process expansion capabilities and remote operation and maintenance functions. It continuously empowers the equipment throughout its entire lifecycle, helping customers build intelligent, highly efficient production line operations.

The acquisition of this bulk repeat order not only validates the stability and reliability of the AST6200 in real mass-production environments but also further consolidates AMIES’ market position in the compound semiconductor lithography equipment field.